Résumé
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
Informations générales
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État actuel: PubliéeDate de publication: 2022-11Stade: Norme internationale publiée [60.60]
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Edition: 3
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Comité technique :ISO/TC 201/SC 4ICS :71.040.40
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Cycle de vie
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Précédemment
AnnuléeISO 14606:2015
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Actuellement
