This document defines the terms involved in atomic layer deposition technology and the corresponding applications. The basis of atomic layer deposition and the physical and chemical properties of thin films, as well as their detection methods are included. The terms in corresponding applications of thin films via atomic layer deposition are defined, such as microelectronics, photovoltaics, display, energy and catalysis.
Status: Under developmentYou can comment on this draft international standard by contacting your national member
Edition: 1Number of pages: 10
Technical Committee: ISO/TC 107 Metallic and other inorganic coatings
This standard contributes to the following Sustainable Development Goal:
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|std 1 40|
|std 2 40||Paper|
ISO/DIS 8181Stage: 40.20
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