ISO/DIS 8181

Abstract

This document defines the terms involved in atomic layer deposition technology and the corresponding applications. The basis of atomic layer deposition and the physical and chemical properties of thin films, as well as their detection methods are included. The terms in corresponding applications of thin films via atomic layer deposition are defined, such as microelectronics, photovoltaics, display, energy and catalysis.

General information

Status
: Under development

You can comment on this draft international standard by contacting your national member
Edition
: 1

Number of pages
: 10
Technical Committee
: ISO/TC 107 Metallic and other inorganic coatings
ICS
:
01.040.25 Manufacturing engineering (Vocabularies)

25.220.01 Surface treatment and coating in general

This standard contributes to the following Sustainable Development Goal:

Industry, Innovation and Infrastructure

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ISO/DIS 8181
Stage: 40.20

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