International Standard
ISO 16531:2020
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Reference number
ISO 16531:2020
Edition 2
2020-10
International Standard
Read sample
ISO 16531:2020
77949
Published (Edition 2, 2020)

ISO 16531:2020

ISO 16531:2020
77949
Language
Format
CHF 129
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Abstract

This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.

General information

  •  : Published
     : 2020-10
    : International Standard published [60.60]
  •  : 2
     : 19
  • ISO/TC 201/SC 4
    71.040.40 
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